Screening Fab Services -
Center Nanoelectronic Technologies (CNT)
Screening Fab Services -
Center Nanoelectronic Technologies (CNT)

Cleanroom Equipment Evaluation

Optimization and qualification of new equipment, parts and consumables for industrial mass production.

Cleanroom Equipment Evaluation for Mass Production

300 mm Screening Fab Services

Timelapse of a tool installation in 300 mm cleanroom at Fraunhofer IPMS - Center Nanoelectronic Technologies (CNT)

The Fraunhofer Screening Fab serves as a platform for tests and evaluation of new equipment, materials and processes under industry standard conditions. All necessary connections and consumables for 200/300 mm wafer processing tools are available in a 800 m² cleanroom  as well as a 650 m² laboratory for metrology and analytics.

We provide a professional tool and wafer handling (ISO 9001 certified), over 10 years experience in semiconductor research and development and close cooperations with the industry. Furthermore the Fraunhofer IP management guarantees legal compliance for our customers.

Example: Evaluation of an Innovative Defect Inspection Tool

The Center Nanoelectronic Technologies (CNT) successfully evaluated an innovative defect inspection tool that combines bright field and dark field imaging in one device. The NextIn Aegis I Wafer Inspection System is now available and qualified for the semiconductor mass production market.

Aegis I Defect Inspection tool for 200/300 mm wafer in CNT cleanroom with user interface (also for remote control).
Certificate of performance test for mass production for Aegis I.

The Screening Fab of  the Fraunhofer Institute for Photonic Microsystems (IPMS)  successfully finished a one year collaborative relationship with South Korean semiconductor equipment manufacturer NextIn. 

As part a cooperation from 2015-2016, a new defect inspection system has been evaluated in the clean room of Center Nanoelectronic Technologies (CNT). The tool allows the visual detection, automatic classification and characterization of different defect types on structured wafers (200 mm and 300 mm).

The NextIn Aegis I Wafer Inspection System makes it possible to combine bright field and dark field imaging in one tool, which significantly increases the number of different applications in semiconductor research and development.The Center Nanoelectronic Technologies (CNT) has evaluated the Aegis I in its research facility in various customer projects and achieved excellent and competitive test results in the sub 100 nm area. 

After this evaluation NextIn is now able to offer a flexible metrology tool for the 2x nm technology node in FEoL, MoL and BEoL processes.  

The Center Nanoelectronic Technologies (CNT) serves as a link between the semiconductor industry and applied science in the segment of 300 mm wafer technology. Manufacturers and suppliers are able to test, optimize and implement new developments on an industrial level for a risk-free integration in mass production.

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